Journal of Applied Sciences 1812-5654 1812-5662 Asian Network for Scientific Information 10.3923/jas.2011.3802.3806 xO_y Thin Layers under Heat Process]]> Kangarlou Haleh Rafizadeh Saeid 12 2011 11 23 Ti films of the same thickness and near normal deposition angle and the same deposition rate were deposited on glass substrates, at room temperature, under UHV conditions. Due to getting properties of Titanium atoms, they specially react with oxygen during evaporation and Ti_xO_y layers produced. Different annealing temperatures as 130 and 330 Celsius degree with uniform 9 cm³ sec^-1 oxygen flow, were used for producing titanium di oxide layers. Their nano structures were determined by AFM and XRD methods. Roughness of the films changed due to annealing process. The getting property of Ti and annealing temperature, can play an important role on the nano-structure of the films.

]]> 1 Karuppasamy, A. and A. Subrahmanyam, 2007 J. Applied Phys., Vol. 101, 2007 2 Garapon, C., C. Champeaux, J. Mugnier, G. Panczer, P. Marchet, A. Catherinot and B. Jacquier, 1996 2 thin films by pulsed laser deposition for waveguiding applications.]]> Applied Surf. Sci., 96-98 836 841 3 Kim, T.W., M. Jung, H.J. Kim, T.H. Park and Y.S. Yoon et al., 1994 Applied Phys. Lett., Vol. 64, 1994 4 Bange, K., C.R. Ottermann, O. Anderson, U. Jeschkowski, M. Laube and R. Feile, 1991 2 films deposited by different techniques.]]> Thin Solid Films, 197 279 285 5 Prasad, K., A.R. Bally, P.E. Schmid, F. Levy, J. Benoit, C. Barthou and P. Benalloul, 1997 2 insulators in thin film electroluminescent devices.]]> Japanese J. Applied Phys., 36 5696 5702 6 Bach, H. and D. Krause, 1997 Thin Films on Glass. Pages: 103 Pages: 103 7 DeLoach, J.D. and C.R. Aita, 1998 Vac. Sci. Technol. A. Vol. 16, 1998 8 Zhao, Z.W., B.K. Tay, S.P. Lau and G.Q. Yu, 2004 J. Crystal Growth, 268 543 546 9 Hsieh, C.C., K.H. Wu, J.Y. Juang, T.M. Uen, J.Y. Lin and Y.S. Gou, 2002 2 films deposited on SrTiO₃(100) by pulsed laser ablation.]]> J. Applied Phys., Vol. 92, 2002 10 Matsui, H., H. Tabata, N. Hasuike, H. Harima and B. Mizobuchi, 2005 2 films grown using a free-radical nitrogen oxide source.]]> J. Applied Phys., Vol. 97, 2005 11 Nakamura, T., T. Ichitsubo, E. Matsubara, A. Muramatsu, N. Sato and H. Takahashi, 2005 Acta Mater., 53 323 329 12 Gyorgy, E., G. Socol, E. Axente, I.N. Mihailescu, C. Ducu and S. Ciuca, 2005 2 thin films obtained by pulsed laser deposition for gas sensing applications.]]> Applied Surf. Sci., 247 429 433 13 Caiteanu, D., E. Gyorgy, S. Grigorescu, I.N. Mihailescu, G. Prodan and V. Ciupina, 2006 Applied Surf. Sci., 252 4582 4586 14 Sharma, A.K., R.K. Thareja, U. Wilier and W. Schade, 2003 Applied Surf. Sci., 206 137 148 15 Moret, M.P., R. Zallen, D.P. Vijay and S.B. Desu, 2000 Thin Solid Films, 366 8 10 16 Tsai, M.H., S.Y. Chen and P. Shen, 2005 TiO₂ particles: Effects of laser energy, oxygen flow rate and phase transformation.]]> J. Aerosol Sci., 36 13 25 17 Yamamoto, S., T. Sumita, T. Yamaki, A. Miyashita and H. Naramoto, 2002 2 films prepared by pulsed laser deposition.]]> J. Cryst. Growth, 237 569 573 18 Dakka, A., J. Lafait, M. Abd-Lefdil and C. Sella, 1999 Moroc. J. Cond. Matter, 2 153 156 19 Stromme, M., A. Gutarra, G.A. Niklasson and C.G. Granqvist, 1996 J. Appl. Phys., 79 3749 3757 20 Durand, H.A., J.H. Brimaud, O. Hellman, H. Shibata and S. Sakuragi et al., 1995 2 optical coating for solar cells.]]> Applied Surf. Sci., 86 122 127