Journal of Applied Sciences1812-56541812-5662Asian Network for Scientific Information10.3923/jas.2007.861.867DableP.J.M.R. ChainetE. YaoB. 6200776WATT bath solution is constituted of NiCl2, NiSO4 with a pH value fixed to 3 with H3BO4. This solution is used as electrolyte for SiC co deposition from Ni/SiC system. The very good embedment of the particles noticed with this solution is due to particles` surface state at this pH value. Particles` surfaces are constituted of chemical groups which, interacting with solutions, play a rule in the surface state. The experimentations undertaken pulled out that the interaction between the electrolyte and groups such as SiO3C and SiC2O2 for example present at the particles` surface, governs zeta potential, which control SiC particles embedment in the nickel matrix. At pH 3 particles are neutral by adsorbing positive and negative species. When they are transported to the reduction pole, the negative adsorbed species are vanished; the particles become positively charged by the silanol protonated groups. As the kinetic of proton reduction is slower then nickel ions one at pH 3, the particles are stuck at the cathode surface and embedded in nickel electrodeposited matrix.]]>Beebhas, C.M.,19907327472749Binner, J. and Y. Zhang,200120123126Diakova, B., C. Filiatre, D. Platikanov, A. Foissy and M. Kaisheva,200296193211Feng, Q.Y., T.J. Li and J.Z. Jin, 2006393539George, D.A.,1992pp: 227-246pp: 227-246Grosjean, A., M. Rezrazi and M. Tachez,199823401408Guglielmi, N.,197211910091009Hashiba, M. and H. Okamoto, Y. Nurishi and K. Hiramayzu,19882328932896Kaisheva, M. and J. Fransaer,2004151C89C96Lavanant, A.,19911991Lee, C.C. and C.C. Wan,198813519301933Mejean, T.M., E. Abdelmounim and P. Guintard,1995349105108Nowak, P., R.P. Socha, M. Kaicheva, J. Fransaer, J.P. Celis and Z. Stoinov,20002 particles with nickel.]]>30429431Sakka, T., D.D. Bridnger and I.A. Aksay,19952479486Shinoda, Y., T. Nagano and H. Gu,19998229162918Snaith, D.W. and P.D. Groves,19725095101Snaith, D.W. and P.D. Groves,197755136140Snaith, D.W. and P. D. Groves,197856914Tomaszewski, T.W., L.C. Tomaszewski and H. Brown,19695612341239Vassen, R. and D. Stober,19998225852599Wang, L.M. and W.C. Wei,1995103434445Wang, C., K.H. Shen, C.S. Lee and W.J. Wei,19991999pp: 7077Wang, S.W. and J.W. Wen-Cheng,20018414111414Webb, P. R. and L.R. Neil,19942O3 thin films.]]>141669673Yeh, S.H. and C.C. Wan,1994249931000