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  <front>

    <journal-meta>

      <journal-title>Information Technology Journal</journal-title>

      <issn pub-type="ppub">1812-5638</issn>

      <issn pub-type="epub">1812-5646</issn>

      <publisher>

        <publisher-name>Asian Network for Scientific Information</publisher-name>

      </publisher>

    </journal-meta>


    <article-meta>

      <article-id pub-id-type="doi">10.3923/itj.2012.492.495</article-id>


      <title-group>

        <article-title><![CDATA[Synchronization Control for Reticle Stage and Wafer Stage Based on Iterative Learning Control]]></article-title>

      </title-group>


      <contrib-group>

        <contrib contrib-type="author" xlink:type="simple">


          <name name-style="western">

            <surname>Wu</surname>

            <given-names>Zhipeng</given-names>

          </name>


          <name name-style="western">

            <surname>Chen</surname>

            <given-names>Xinglin</given-names>

          </name>


        </contrib>

      </contrib-group>


      <pub-date pub-type="collection">


        <month>4</month>




        <year>2012</year>

      </pub-date>


      <volume>11</volume>

      <issue>4</issue>


      <abstract><![CDATA[<p></B> In order to resolve the problem that the reticle stage and the wafer stage must move synchronously during the scanning process, a synchronization controller is designed based on iterative learning control theory. The control system is a typical master-slave synchronization structure and the reticle stage is chosen as the slave system. An open-loop type synchronization learning controller is added to the feedback control system of the reticle stage and the convergence in the iteration domain is proved. Simulation results show that the synchronization learning method can reduce the synchronization error evidently.</p>]]></abstract>


    </article-meta>

  </front>


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</article>

