The influence of reactor pressure on qualities of GaN layers grown by hydride vapor phase epitaxy

X.C. Cao, D.L. Xu, H.M. Guo, C.J. Liu, Z.J. Yin, X.H. Li, K. Qiu and Y.Q. Wang

Thin Solid Films 517 ( 6 ): 2088 - 2091 , 2009