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Articles by S. Gayathri
Total Records ( 2 ) for S. Gayathri
  E. Sreepradha , Tamma Durga Bhavani , S. Gayathri and M. Sridharan
  Titanium Nitride (TiN) is an interstitial nitride with remarkable hardness, adhesion and toughness making it ideal for thin film applications. In this work the effect of substrate bias and substrate temperature on crystallinity, morphology, hydrophobicity and adhesion of TiN films has been studied. The films were deposited by dc magnetron sputtering on well-cleaned substrates of glass, silicon (100) and stainless steel (AISISS304). The deposited films were analysed using X-ray Diffraction (XRD), Field Emission Scanning Electron Microscope (FE-SEM), contact angle measurement and scratch testing. Grains with globular and columnar morphology were formed and the films were predominantly hydrophilic in nature. In the absence of substrate bias amorphous films were formed and (111) and (200) planes appeared with substrate heating and bias. Improved adhesion was observed at lower bias and higher temperatures.
  S. Gayathri , S. Muthumari , S. Arockia Shyamala , G. Devi , R. Vijayalakshmi and C. Sanjeeviraja
  Growth and characterization of tungsten selenide (WSe2) thin films has been active research in photovoltaic and photoconductive devices. The structural and optical properties due to the thermal annealing effects of nanocrystalline WSe2 thin films are prepared on fluorine doped tin oxide (FTO) substrate by brush plating technique. The parameters like brushing time (45 min), concentration (0.1 N) and current (1 mA) are optimized to get well adherent, polycrystalline films. The films are uniform and matt black in appearance. Slight color change was observed after annealing. The X-Ray Diffraction (XRD) spectra showed the hexagonal structure and the peaks are compared with JCPDS value (06-0080). The As-deposited film was amorphous and the maximum preferential orientation was observed on the (004) plane for the films (annealed to 300 and 500°C). The high intensity peak was observed in the XRD pattern of annealed films. The optical band gap reduced with increase in annealing temperature.
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