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Titanium Nitride (TiN) is an interstitial nitride with remarkable hardness,
adhesion and toughness making it ideal for thin film applications. In this work
the effect of substrate bias and substrate temperature on crystallinity, morphology,
hydrophobicity and adhesion of TiN films has been studied. The films were deposited
by dc magnetron sputtering on well-cleaned substrates of glass, silicon (100)
and stainless steel (AISISS304). The deposited films were analysed using X-ray
Diffraction (XRD), Field Emission Scanning Electron Microscope (FE-SEM), contact
angle measurement and scratch testing. Grains with globular and columnar morphology
were formed and the films were predominantly hydrophilic in nature. In the absence
of substrate bias amorphous films were formed and (111) and (200) planes appeared
with substrate heating and bias. Improved adhesion was observed at lower bias
and higher temperatures.
