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Articles by C.H. Huang
Total Records ( 2 ) for C.H. Huang
  B.P. Wang , D. Zhang , Y.Y. Liu , F. Wang , S.Y. Wang , L.D. Han , C.Y. Liu , C.X. Liu , J.P. Liu , J. Pan , W.B. Zhang , Tuo Ya , Zhaori Getu , Daolema , C.H. Huang , J.L. Han , Suya , L.G. Zhang , H.M. Zhou and L. Zhang
  The current study investigated the ovarian response to gonadotropin for establishing a suitable protocol of superovulation in Bactrian camel. Fifteen female camels were randomly divided into 4 groups to compare 4 different superovulation protocols during the natural breeding season. Each camel in 4 groups was injected with FSH at 80, 80, 60, 60, 60, 60, 40 and 40 mg, respectively total dosage of 480 mg, for consecutive 4 days at 12 h intervals. The camels in group 2-4 were naturally mated and subsequently injected 300 IU LH 48 h after the last injection of FSH, the camels in group 1 received the same procedure exception of LH injection. Ovarian follicles and corpora luteas were observed through synchronistic laparotomy 7-9 days after natural mating. The results indicated that there is no significant difference in average ovulation rate (p>0.05) among group 1-3 nor among group 2-4. However, there is considerable difference between group 1 and 4 in average ovulation rate (p<0.05), among which the value is highest (81.38±6.44%) for group 4 but lowest (16.89±7.98%) for group 1. Furthermore, the average number of follicles has yet no obvious difference (p>0.05) among group 1-3 nor among group 2-4 but significant difference (p<0.05) between group 1 and 4. Comparatively the animals in group 1 yielded highest average number of follicles (9.80±1.50). Conclusively, the protocol 4 had a best superovulatory effect with an average corpora lutea 9.33±1.45 and therefore it can be used for superovulation in camels.
  S.T. Chen , C.H. Huang and G.S. Chen
  In this work, various vacuum plasma types, generated by either single gaseous sources (N2 or H2) or mixed sources (N2-H2) are incorporated into an aqueous-solution electrochemical seeding process to pre-treat the surfaces of SiO2 dielectric layers. Under the optimal plasma atmosphere (monitored by optical emission spectroscopy), the dielectric surfaces can be modified to terminate by hydrophilic bonds, accelerating the adsorption of a crowd of catalytic seeds as small as 3 nm. Such a seeding refinement allows for the growth of a Co-based barrier layer with thickness as thin as 10 nm using electroless plating. Moreover, the capacity of integrating the plasma surface pretreatment with the seeding and electroless-plating process steps to deposit an ultrathin copper-stacked metallization layer in a selective and sequential manner on blanket wafers will be demonstrated by the fabrication of copper-gated and barrier-interposed capacitors. Finally, a tentative work of filling the seeds and the barrier layer into trenches of a patterned wafer was carried out, demonstrating the potential of the reported technique for advanced technology nodes of 60 nm or less.
 
 
 
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