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Thin Solid Films
Year: 2010  |  Volume: 518  |  Issue: 15  |  Page No.: 4294 - 4298

Texture and microstructure of Cr2O3 and (Cr,Al)2O3 thin films deposited by reactive inductively coupled plasma magnetron sputtering

K. Pedersen, J. Bottiger, M. Sridharan, M. Sillassen and P. Eklund    

Abstract: Cr2O3 and (Cr,Al)2O3 films were grown using reactive dc and inductively coupled plasma magnetron sputtering at substrate temperatures of 300-450°C. For pure chromia, α-Cr2O3 films with fiber texture were grown; the out-of-plane texture could be controlled from < 0001 > to < 101̅4>. The former texture was obtained as a consequence of competitive growth with no applied bias or inductively coupled plasma, while the latter was obtained at moderate bias (-50 V), probably due to recrystallization driven by ion-bombardment-induced strain. By reactive codeposition of Cr and Al, a corundum-structured metastable solid solution α-(Cr,Al)2O3 with Cr/Al ratios of 2-10 was grown with a dense, fine-grained morphology. Hardness and reduced elastic modulus values were in the ranges 24-27 GPa and 190-230 GPa, respectively.

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