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Trends in Applied Sciences Research
Year: 2012  |  Volume: 7  |  Issue: 8  |  Page No.: 701 - 705

Deposition Angle as an Important Factor on Structural Changes of Thin Films

Haleh Kangarlou and Elham Soltanalizadeh    

Abstract: Aluminum oxide thin films of 67 nm thickness at two different deposition angles of 20 and 50 degrees were deposited on glass substrates at room temperature, by using resistive evaporation method under Ultra High Vacuum (UHV) conditions. The structural details were determined by AFM and SEM methods. The optical spectra were measured by spectrophotometer in the spectral range of 300-1100 nm wave length (UV-Vis). The relation between nanostructures and optical properties with deposition angle were discussed.

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