Asian Science Citation Index is committed to provide an authoritative, trusted and significant information by the coverage of the most important and influential journals to meet the needs of the global scientific community.  
ASCI Database
308-Lasani Town,
Sargodha Road,
Faisalabad, Pakistan
Fax: +92-41-8815544
Contact Via Web
Suggest a Journal
Asian Journal of Applied Sciences
Year: 2014  |  Volume: 7  |  Issue: 8  |  Page No.: 809 - 813

Al and Cu Thin Film Capacitors for Void Fraction Measurement

K.J. Kumaresh, P. Deepak Raj and M. Sridharan    

Abstract: The fabrication of thin film based capacitors with different metal electrodes (Al, Cu) and their application towards void fraction measurement is carried out in this study. Void fraction is a measure of empty spaces in any medium. The void fraction is measured as capacitance in the capillary tube and processed through embedded system. The thin film capacitor is designed on a capillary tube through thermal evaporation technique with the above given metal elements. Capillary tube with different diameters ranging from 5-10 mm and length of 7 inch were used and deposited with metal elements mentioned above with a small distance between them. The capillary tube is used as insulator with metal elements deposited above them as metal electrodes. Changes in capacitance value due to the voids were measured through LCR/Z meter. Before coating the electrodes on the capillary tubes, the films were characterized for their structural, morphological and electrical properties to obtain capacitors with desired value of capacitance.

Cited References   |    Fulltext    |   Related Articles   |   Back
   
 
 
 
  Related Articles

 
 
 
 
 
 
 
 
 
Copyright   |   Desclaimer   |    Privacy Policy   |   Browsers   |   Accessibility