Abstract: In this investigation, anatase TiO2 thin films were deposited on glass substrates at room temperature by RF magnetron sputtering at an elevated sputtering pressure of 3 Pa. The TiO2 films deposited at room temperature were annealed at different temperatures up to 873°K for 1 h. The TiO2 films were characterized by X-Ray Diffraction (XRD), Field-Emission Scanning Electron Microscopy (FESEM), Atomic Force Microscopy (AFM) and UV-visible-NIR spectrophotometry. The XRD results reveal that the as-deposited film possess the anatase structure. Annealed TiO2 films show an insignificant change in crystallinity except of the fact that there is a slight increase for the film annealed at 600°C. The crystallite size increases from 44.5 to 48 nm with the increase of the annealing temperature. As-grown TiO2 film exhibits high visible transmittance with enhanced refractive index of 2.31 at a wavelength of 550 nm. The indirect optical band gaps of the as-deposited and annealed films have been estimated to be in the range of 3.39-3.42 eV. AFM observations reveal the compact and dense morphology of the as-deposited and annealed TiO2 thin films.