Research Article
Silicon Carbon Nitride Thin Films Deposited by Pulsed Microwave Plasma Assisted Chemical Vapour Deposition
Laboratory of Fundamental Physics and Applications, Nangui Abrogoua University, 02 BP 801 Abidjan 02, Ivory Coast, Cote d`Ivoire
Pamela Yoboue
African Higher School of Information and Communication Technologies (ESATIC), Abidjan, Ivory Coast, Cote d`Ivoire
Bafetigue Ouattara
Laboratory of Fundamental Physics and Applications, Nangui Abrogoua University, 02 BP 801 Abidjan 02, Ivory Coast, Cote d`Ivoire
Mohammed Belmahi
Jean Lamour Institute (IJL) CNRS UMR 7198, University of Lorraine, BP 239, F-54506 Vandoeuvre Cedex, France
Jamal Bougdira
Jean Lamour Institute (IJL) CNRS UMR 7198, University of Lorraine, BP 239, F-54506 Vandoeuvre Cedex, France